Influence of N2 and CH4 on depositon rate of boron based thin films prepared by magnetron sputtering

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Authors	ELIÁŠ Marek SOUČEK Pavel VAŠINA Petr
Year of publication	2008
Type	Article in Periodical
Magazine / Source	Chemické listy
MU Faculty or unit	Faculty of Science
Citation
web	http://www.chemicke-listy.cz/ojs3/index.php/chemicke-listy/article/view/4322/4267
Field	Plasma physics
Keywords	hysteresis; reactive sputtering; hybrid deposition process
Description	The paper study deposition rate of boron based thin films prepared by means of hybrid PVD-PECVD process and derive conclusions about process behaviour. Paper, interdisciplinary study of plasma physics
Related projects:	Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface Study of hybrid deposition process and its application for thin film deposition