Evolution of discharge parameters and sputtered species ionization in reactive HiPIMS with oxygen, nitrogen and acetylene

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Publikace nespadá pod Lékařskou fakultu, ale pod Přírodovědeckou fakultu. Oficiální stránka publikace je na webu muni.cz.

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FEKETE Matej BERNÁTOVÁ Katarína KLEIN Peter HNILICA Jaroslav VAŠINA Petr

Rok publikování 2019
Druh Článek v odborném periodiku
Časopis / Zdroj Plasma Sources Science and Technology
Fakulta / Pracoviště MU

Přírodovědecká fakulta

Citace
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Doi http://dx.doi.org/10.1088/1361-6595/ab0363
Klíčová slova magnetron sputtering; reactive HiPIMS; ionization fraction; titanium; oxygen; nitrogen; acetylene
Popis Reactive high power impulse magnetron sputtering offers a great opportunity for high quality coating production, thus understanding the processes accompanying deposition is of great importance. In this paper, the evolution of numerous discharge parameters such as total pressure, discharge current and sputtered species number densities are studied in argon with oxygen, nitrogen or acetylene admixture. The experiments are compared to the reactive direct current magnetron sputtering where the deposition process usually exhibits hysteresis behaviour and the ionization fraction of sputtered species is significantly lower. The decrease in the titanium atom and ion number densities with the increasing degree of target poisoning is detected for all the studied admixtures. However, while the sputtered species number densities decrease the sputtered species ionization fraction increases. Depending on the reactive gas admixture, the ionization fraction of the sputtered species increases from 75% achieved in pure argon discharge up to 90% attained in the poisoned mode of the reactive sputtering. This increase was the most pronounced for oxygen and nitrogen admixtures. Mutual comparison of the reactive sputtering with nitrogen, oxygen and acetylene indicated multiple causes for the observed increase.
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